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Wafer Hotplates

Our wafer hotplates provide the uniform thermal contact you need for soft lithography, curing PDMS, and baking SU-8 photoresist. You get precise temperature control up to 400°C without the hot spots that ruin delicate microstructures.

These units are perfect for standard cleanroom fabrication, but keep in mind that thick aluminum plates have high thermal inertia and take a while to cool down between process steps. If you need advice on matching a heating profile to your specific resist thickness, just send me your protocol.

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  • New
    Wafer Hot Plate - POLOS HOTPLATE 200

    POLOS

    Wafer Hot Plate - POLOS HOTPLATE 200
    The POLOS Hotplate 200 Standard and Advanced are precision cleanroom-compatible laboratory hotplates designed for soft bake, hard bake, and curing processes requiring accurate and repeatable...
  • New
    Wafer Hot Plate - POLOS HOTPLATE 350 Advanced

    POLOS

    Wafer Hot Plate - POLOS HOTPLATE 350 Advanced
    The POLOS Hotplate 350 Advanced is a precision, cleanroom ready, laboratory hotplate designed for soft bake, hard bake, and curing processes on substrates up to 300 mm. General The POLOS Hotplate 350...
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