The POLOS SPIN150x Standard and Advanced are precision cleanroom-compatible spin coaters for repeatable substrate processing up to 150 mm, available in NPP or PTFE and designed for tabletop operation.
General
The POLOS SPIN150x series is designed for precise and repeatable spin coating of wafers and substrates up to 150 mm / 6". Available in Standard and Advanced versions, the system is suitable for R&D, cleanroon, laboratory, and low-volume production environments.
Both models are available in natural polypropylene (NPP) or chemically resistant PTFE and support substrates up to 100 x 100 mm. NPP is a cost-effective solution for standard photoresist and solvent processes, while PTFE is recommended for aggressive chemistries and applications requiring maximum chemical resistance. A tabletop configuration is standard, with integrator/in-deck models available upon request.
The SPIN150x features an indirect brushless drive system with speeds up to 12,000 RPM, high acceleration accuracy, clockwise/counter-clockwise rotation, and puddle mode for stable coating performance.
Standard features include a liquid filter trap, centre injection holder, lid lock, vacuum sensor, detachable touchscreen display, and USB connectivity for recipe storage and software updates.
The Advanced model adds automation-oriented functionality including auto lid operation, easy chamber access, and optional dispense vessel, linear dispense arm, and backside rinse configurations.
The system is suitable for coating, cleaning, rinse/dry, developing, etching, PDMI, and related substrate processing applications.
Features & Benefits
- Flexible chamber material: Available in natural polypropylene (NPP) for standard coating applications or chemically resistant PTFE for aggressive solvents, acids, and advanced process chemistries.
- Integrator-ready configuration: Tabletop operation is standard, with integrator/in-deck configurations available upon request.
- High-speed drive: Indirect brushless drive unit supports speeds up to 12,000 RPM, depending on substrate and chuck.
- Precise process control: High acceleration accuracy, CW/CCW rotation, and puddle mode support consistent coating results.
- Liquid filter trap: Captures liquids entering the vacuum lines to help protect critical system components.
- User safety: Lid lock and vacuum sensor improve safe operation during processing.
- Touchscreen interface: Large detachable touchscreen display provides convenient operation and recipe control.
- USB connectivity: Allows recipes to be stored on USB drive and supports software updates.
- Advanced automation capability: Advanced model includes auto lid functionality and easy chamber access for handling with an end-effector, tweezers, or vacuum wand.
Applications
The POLOS SPIN150x is suitable for cleanroom, laboratory, semiconductor, and substrate processing workflows involving positive photoresist, negative photoresist, epoxy, polyimide, and related coating chemistries.
- Spin coating
- Positive and negative photoresist processing
- Polyimide coating
- Cleaning
- Rinse/dry processes
- Developing
- Etching
- PDMI and related substrate processing
- R&D and low-volume production
- Automated or robot-assisted substrate handling with the Advanced version
Content
1x POLOS SPIN150x Spin Coater, Standard or Advanced version depending on selected model
1x Vacuum chuck for 4 - 6 inch wafers
1x Fragment adapter for fragments of 10 mm and larger
Specifications
| Specification |
SPIN150x Standard |
SPIN150x Advanced |
| Process chamber material |
Natural Polypropylene (NPP) or PTFE |
| Max. substrate diameter |
Up to 6" / 150 mm wafers |
| Max. substrate size |
Up to 4" x 4" / 100 x 100 mm substrates |
| Type |
Tabletop (Integrator model upon request) |
| Drive unit |
Indirect brushless drive unit, up to 12,000 RPM |
| Acceleration / Deceleration |
1 - 30,000 RPM |
| Rotation modes |
CW, CCW rotation and puddle mode |
| Liquid filter trap |
Yes |
| Unique outer shell and drain design |
Yes |
| Center injection holder for syringe or dispense nozzle |
Yes |
| Lid lock and vacuum sensor for user safety |
Yes |
| Large detachable touchscreen display |
Yes |
| USB port for recipe storage and software updates |
Yes |
| Programmable motor home position |
Yes |
| Easy chamber access |
No |
Yes |
| Auto lid |
No |
Yes |
| Dispense vessel |
No |
Yes* |
| Linear dispense arm |
No |
Yes* |
| Backside rinse |
No |
Yes* |
*Upon request
Documentation
POLOS Spin150x - Data Sheet
